Sputtering Equipment EC7000
Built on our proven expertise in vacuum and sputtering technologies, the EC7000 offers sputtering equipment ideal for R&D and small-scale production.
A variety of optional functions allows you to customize the system to meet your specific requirements.
Information
- R&D, Small-scale production
- Fully automated operations (pumping, substrate transfer, deposition process)
- Supports up to four Φ4" cathodes
- High temperature substrate heating (up to 800℃)
- Space-saving design with an integrated mainframe and control rack
- Substrate size : Φ4-inch, Φ6-inch, Φ8-inch, Tray-based substrate
- Number of installed modules : up to 2 modules