Sputtering Equipment FC7100
FC7100 is sputtering equipment that has become the de facto standard for high-k metal gate applications.
Information
- Logic
- Peripheral circuits
- CMOS Image Sensor
- Atomic-level thickness uniformity and precise film thickness control
- Stable reactive sputtering in both metal mode and poison mode discharge regions
- Excellent optical property stability through real-time monitoring and correction (graph1)
graph1
- Substrate size : Φ12-inch
- Number of installed modules : up to 5 modules
- Configurable modules : etching, oxidation, heating