Memory Wire PVD Mass Production Equipment IC7500

A cluster type PVD equipment supporting thin film deposition of metal wiring material used mainly in semiconductor memory.
Our original CAELA cathode provides excellent uniformity and low particle on reactive sputtering and high stress materials.
These functions enable high yield and productivity to significantly reduce production cost.


Semiconductor memory (for metal wiring material) mass production

  • Cathode magnet position (3D) is variable in-situ per each recipe.
    (enables easy optimization of uniformity and cleaning)
  • Provides world's highest standard throughput (80wfs/H).
  • Provides >90% uptime rate at semiconductor memory production line. (failure rate < 1%)
  • System configuration:Cluster type
  • Substrate size:φ300mm