PVD Equipment for Semiconductor (φ300mm support) EC7800
Upgrade from HC7100 (PVD equipment for head) enabling mass-production of φ300 mm wafers based on experience with the φ300 mm wafer production line.
Architectural integration with the proven I-1000 series enables utilization of conventional software assets such as EES.
Information
R&D of MRAM
- Offers excellent film thickness distribution of ±1% or less with the use of new sputtering technology LRP (Low Pressure Remote Plasma Sputtering).
- Provides very flat and low resistance film with low pressure discharge at 0.02Pa, which is an order of magnitude lower than conventional sputtering pressure.
- Provides high MR ratio with ultra-high vacuum.
- Extensive deposition module lineup. (multi-cathode specification)
- System configuration:Cluster type
- Substrate size:φ300mm