Dry Etching Equipment EC8000
Mass production equipment capable of integrated processing of MRAM magnetic multilayer film mask/MTJ (dry etching) and protective film formation (CVD).
Information
R&D of MRAM
- Offering high yield with real devices
- Enables micropattern processing free of shorts at the mass-production level.
- Capable of retaining a high MR ratio even after etching.
- Capable of integrated formation of protective films after processing (CVD chamber expansion).
- Low-damage process with CH3OH gas.
- Easy maintenance and flexible equipment configuration
- System configuration:Cluster type
- Substrate size:φ300mm