MRAM PVD Equipment NC7900

NC7900 is PVD equipment to form multi-stacked MTJ layers which is a core element of next generation non-volatile memory.

NC7900 is also compatible with formation of perpendicular stacked MTJ for STT-MRAM.


MRAM volume manufacturing

  • Ultra-high vacuum and oblique angle rotation PVD
  • Fine interface control with ultra-thin multi-layers
  • Compatible with Planar & Perpendicular MTJ formation
  • Throughput of 25 wafers/h with perpendicular MTJ process is achieved
  • System configuration:Cluster type
  • Substrate size:φ300mm