MRAM PVD Equipment NC7900
NC7900 is PVD equipment to form multi-stacked MTJ layers which is a core element of next generation non-volatile memory.
NC7900 is also compatible with formation of perpendicular stacked MTJ for STT-MRAM.
Information
MRAM volume manufacturing
- Ultra-high vacuum and oblique angle rotation PVD
- Fine interface control with ultra-thin multi-layers
- Compatible with Planar & Perpendicular MTJ formation
- Throughput of 25 wafers/h with perpendicular MTJ process is achieved
- System configuration:Cluster type
- Substrate size:φ300mm