Sputtering Equipment EB1000
EB1000 is sputtering equipment designed most cost-effective and space-saving in our line-up.
Depending on your application, such as research and material development, we can provide an optimized system tailored to your requirements at an affordable price.
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Information
- R&D, Material Development
- Equipped with three Φ2inch compact cathodes
- Three‑source co‑sputtering
- High temperature substrate heating (up to 800℃)
- Substrate size : Φ4-inch, Φ6-inch, Φ8-inch, Tray-based substrate