PVD Equipment for R&D/Small-Scale Production EB1100
Consolidating our proven experience in vacuum and sputtering technology, the EB1100 is high performance PVD equipment suitable for R&D and small-scale production.
A variety of optional functions enables you to optimize the system according to your needs.
Information
R&D, small-scale production
- Standard equipped with load lock chamber
- Fully automated operations (pumping, substrate transfer, deposition process)
- Supports up to four φ4" cathodes (three by default)
- Simultaneous sputtering (Option)
- High temperature substrate heating (up to 800℃) (Option)
- Support for various substrate sizes (≤ φ220mm) and deposition methods (offset self-rotational deposition, static facing deposition) by tray transport
- Space saving with unit body design main system
- System configuration:Load lock type tray transport method
- Substrate size:φ200mm maximum
- Cathode:φ4" cathode ×3
(Option: φ12.5" cathode ×1, φ4" cathode ×4) - Operation method:Fully automated (pumping, transport, deposition)