PVD Equipment for R&D/Small-Scale Production EB1100

Consolidating our proven experience in vacuum and sputtering technology, the EB1100 is high performance PVD equipment suitable for R&D and small-scale production.
A variety of optional functions enables you to optimize the system according to your needs.


R&D, small-scale production

  • Standard equipped with load lock chamber
  • Fully automated operations (pumping, substrate transfer, deposition process)
  • Supports up to four φ4" cathodes (three by default)
  • Simultaneous sputtering (Option)
  • High temperature substrate heating (up to 800℃) (Option)
  • Support for various substrate sizes (≤ φ220mm) and deposition methods (offset self-rotational deposition, static facing deposition) by tray transport
  • Space saving with unit body design main system
  • System configuration:Load lock type tray transport method
  • Substrate size:φ200mm maximum
  • Cathode:φ4" cathode ×3
    (Option: φ12.5" cathode ×1, φ4" cathode ×4)
  • Operation method:Fully automated (pumping, transport, deposition)