Sputtering Equipment EB1100

Built on our proven expertise in vacuum and sputtering technologies, the EB1100 offers sputtering equipment ideal from R&D to small-scale production.

A variety of optional functions enables you to optimize the system according to your needs.

Information

  • Small-scale production, R&D, and materials development

  • Fully automated operations (pumping, substrate transfer, deposition process)
  • Supports up to four Φ4" cathodes
  • High temperature substrate heating (up to 800℃)
  • Space-saving design via integrated mainframe and control rack
  • Substrate size : Φ4-inch, Φ6-inch, Φ8-inch, Tray-based substrate

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